The data size generated by curvilinear masks could impact turnaround time (TAT) for photomask production and hence the adoption of curvilinear masks. In a previous blog on curvilinear masks, our panel ...
“Full-chip curvilinear inverse lithography technology (ILT) requires mask writers to write full reticle curvilinear mask patterns in a reasonable write time. We jointly study and present the benefits ...
This is a preview. Log in through your library . Journal Information Econometrica publishes original articles in all branches of economics - theoretical and empirical, abstract and applied, providing ...
A mechanical deformation of a continuum can be expressed as a generalized coordinate transformation of space. Consequently, the equations of electrostatics in deformable media must satisfy covariance ...
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