The data size generated by curvilinear masks could impact turnaround time (TAT) for photomask production and hence the adoption of curvilinear masks. In a previous blog on curvilinear masks, our panel ...
“Full-chip curvilinear inverse lithography technology (ILT) requires mask writers to write full reticle curvilinear mask patterns in a reasonable write time. We jointly study and present the benefits ...
This is a preview. Log in through your library . Journal Information Econometrica publishes original articles in all branches of economics - theoretical and empirical, abstract and applied, providing ...
A mechanical deformation of a continuum can be expressed as a generalized coordinate transformation of space. Consequently, the equations of electrostatics in deformable media must satisfy covariance ...
Results that may be inaccessible to you are currently showing.
Hide inaccessible results
Feedback